New process developed for future chips
The developers at Intel have succeeded in producing photo masks for Extreme Ultra Violet (EUV) lithography. These masks are important inventions for the EUV process as a future generation of lithography for the semiconductor industry.
So far, it has been a challenge to manufacture very precise masks using the EUV process. These differ from ordinary masks in a few ways. Standard carriers are currently used for the production of integrated circuits to transmit light. Deep Ultra Violet (short: DUV-) light penetrates these materials, but EUV light is absorbed by the atmosphere and many other materials and reflects the light instead of transmitting it.